In situ UV nano-imprint lithography alignment using high contrast mark
نویسندگان
چکیده
منابع مشابه
In-situ monitoring of pattern filling in nano-imprint lithography using surface plasmon resonance.
Nano-imprint lithography possesses the advantages of high throughput, sub-10-nm feature and low cost. In NIL, the mold filling is subjected to the applied imprinting pressure, temperature and time. Incomplete mold filling causes a detrimental effect on the final imprinted pattern dimensions. The monitoring system of imprinting is essential to control the imprinting parameters properly. Up to no...
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A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have followed the line initiated by de Gennes, using a Molecular Stress Function model of the Doi and Edwa...
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We report epitaxial growth of AlN films with atomically flat surface on nano-patterned sapphire substrates (NPSS) prepared by nano-imprint lithography. The crystalline quality can be greatly improved by using the optimized 1-μm-period NPSS. The X-ray diffraction ω-scan full width at half maximum values for (0002) and (102) reflections are 171 and 205 arcsec, respectively. The optimized NPSS con...
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The Step and Flash Imprint Lithography (SFIL) process is a low-cost, high-throughput patterning technique with a sub-100 nm resolution capability. Investigation by this group and others indicates that the resolution of replication by imprint lithography is limited only by the size of the structures that can be created on the template. It has also been demonstrated that the SFIL process is capab...
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Conventional methods used to fabricate the light guide plates (LGPs), such as injection molding and hot embossing, are difficult and unsuitable. In this study, the authors propose a new manufacturing process for the roll-to-plate UV imprint lithography (RPIL) technique that fabricates LGPs with dot patterns. A flexible and transparent sheet mold with microstructures required by the RPIL machine...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2015
ISSN: 1094-4087
DOI: 10.1364/oe.23.018518